서강대학교

목차

Chapter 1. Introduction 1
1.1 Chemical Resistance of Solution-Processed Thin Films 1
1.1.1 Solution-Processed Thin Films 1
1.1.2 Chemical Resistance in Solution Process 5
1.2 Efficient and High-Performance Display
1.2.1 Light-Emitting Diodes (LEDs) 9
1.2.2 Light-Emitting Diodes with Enhanced Chemical Resistance 13
1.3 High-Sensitivity Photoresist in Sub-um Lithography 17
1.3.1 Photoresists (PRs) 17
1.3.2 Photoresists with Enhanced Chemical Resistance 20
1.4 References 23
Chapter 2. Chemical Resistance in the Nanostructure Film 28
2.1 Core-Ligand Nanostructures and Crosslinking Techniques for Chemical Resistance 28
2.1.1 Core-Ligand Nanostructures 28
2.1.2 Crosslinking Methods of Core-Ligand Nanostructures 30
2.2 Additive Crosslinker for Quantum Dot Light-Emitting Diodes 32
2.2.1 Quantum Dots and Photocrosslinkers 32
2.2.2 Crosslinking Strategy in Quantum Dot Light-Emitting Diodes 34
2.3 Crosslinking Ligand for Organometallic Photoresists 37
2.3.1 Organometallic Photoresists 37
2.3.2 Crosslinking Strategy in Photoresists 39
2.4 References 42
Chapter 3. Quantum Dot-Based Tandem Near-Infrared-to- Visible Optoelectric Upconversion Devices 45
3.1 Introduction 45
3.2 Result & Discussion 52
3.2.1 1Abs-1EL Structures 52
3.2.2 Effect of the Solution Process Based on Butylamine on the Underlying Functional Layers 58
3.2.3 Systemic Comparisons of the Device Operations 60
3.2.4 More Efficient Devices Through Optimization of the 1Abs-1EL Structures 64
3.2.5 Non-Toxic QD-Based 1Abs-1EL Structures 73
3.3 Conclusion 78
3.4 Experimental Section 80
3.5 References 87
Chapter 4. Organotin Carboxylate Resist Containing Azide Functional Group for Lithography 93
4.1 Introduction 93
4.2 Result & Discussion 96
4.2.1 Structure of Organotin Carboxylate Resists 96
4.2.2 Crosslinking Mechanism of Azide-Based Organotin Carboxylates 100
4.2.3 Azide-Based Resist with Improved Sensitivity and Pattern Quality 110
4.3 Conclusion 116
4.4 Experimental Section 117
4.5 References 126