Skyrmion Phase in MnSi Thin Films Grown on Sapphire by a Conventional Sputtering
- 주제(키워드) 도움말 MnSi , Sputtering , Polycrystal , Skyrmion , Topological Hall effect
- 발행기관 SPRINGER
- 발행년도 2021
- 총서유형 Journal
- 본문언어 영어
초록/요약 도움말
Topologically protected chiral skyrmions are an intriguing spin texture that has attracted much attention because of fundamental research and future spintronic applications. MnSi with a non-centrosymmetric structure is a well-known material hosting a skyrmion phase. To date, the preparation of MnSi crystals has been investigated by using special instruments with an ultrahigh vacuum chamber. Here, we introduce a facile way to grow MnSi films on a sapphire substrate using a relatively low vacuum environment of conventional magnetron sputtering. Although the as-grown MnSi films have a polycrystalline nature, a stable skyrmion phase in a broad range of temperatures and magnetic fields is observed via magnetotransport properties including phenomenological scaling analysis of the Hall resistivity contribution. Our findings provide not only a general way to prepare the materials possessing skyrmion phases but also insight into further research to stimulate more degrees of freedom in our inquisitiveness.
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