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3.3kV 4H-SiC MOSFET with high reliability characteristics

3.3kV급 4H-SiC MOSFET 신뢰성 특성 연구

초록/요약

A 3300 V 4H-SiC MOSFET with a dummy polysilicon connected to the source and the p+ region inserted underneath the p-base (DP-MOSFET) is proposed. The improvements in the switching performance and short-circuit withstand capability are confirmed through technology computer-aided design simulation. Compared with the conventional 4H-SiC MOSFET (C-MOSFET), the dynamic figure of merit (FOM = Ron-sp × QGD) of the DP-MOSFET is effectively improved without deteriorating the Baliga’s figure of merit (FOM = BV2 / Ron-sp). In addition, the low saturation current alleviates the heat dissipation during turn-on, hence, the short-circuit withstand time (tsc) increases by almost two times. The proposed DP-MOSFET can be considered as one of the most promising candidates for high-performance, high-frequency and high-power applications.

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